Patent · US Active

Systems, devices and methods for spark plasma sintering

US11229950B2 · kind B2 · utility

1Cited by

12References

11Claims

0Family size

Assignee

RAYTHEON TECHNOLOGIES CORPORATION · US

Inventors

John R. Paulus · Afton, US
Jon Moore · Charlottesville, US
Benjamin Heneveld · Arlington, US

Key dates

Filing date	Apr 23, 2018
Grant date	Jan 25, 2022
Priority date	—
Expiry date	Sep 23, 2039

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC04B2235/666
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

A method of forming an article including: contacting a fugitive tool with a powdered parent material; densifying the powdered material; and destructively removing the fugitive tool. A coating of a different material may be formed against the parent material using a similar approach.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.