Liquid chemical vapor recovery device, wet stripping device, photoresist stripping process, and method for manufacturing thin film transistor-liquid crystal display using the same
US11231652B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 13, 2018 |
| Grant date | Jan 25, 2022 |
| Priority date | — |
| Expiry date | Jun 21, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6715
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Disclosed is a liquid chemical vapor recovery device, a wet stripping device, a photoresist stripping process and a method for manufacturing a thin film transistor-liquid crystal display using the same. The liquid chemical vapor recovery device comprises: an exhaust pipe for discharging a gas in a processing chamber for wet processing with a liquid chemical, the gas comprising a vapor of the liquid chemical; and a reflux pipe for refluxing the liquid chemical condensed in the exhaust pipe to a liquid chemical storage tank, the reflux pipe having an inlet connected to the exhaust pipe and an outlet connected to the liquid chemical storage tank, wherein, at least a part of the exhaust pipe positioned upstream of the inlet of the reflux pipe is formed as a pipe segment with a rugged inner surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.