Atomic layer deposition device for massively coating micro-nano particles
US11236421B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | Apr 15, 2019 |
| Grant date | Feb 1, 2022 |
| Priority date | — |
| Expiry date | Jan 14, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An atomic layer deposition device for massively coating micro-nano particles, includes a reaction chamber and a particle container, in which an inlet port is provided at a lower end of the reaction chamber, and an inlet pipe for introducing a precursor or a carrier gas is provided in the inlet port; a chamber door is provided at an upper end of the reaction chamber, so that the particle container can be freely placed in or removed out of the reaction chamber; an air inlet hole is provided at a lower end of the particle container, and the inlet pipe enters the particle container through the air inlet hole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.