Plasmonic diamond films and related methods
US11236426B2 · kind B2 · utility
1Cited by
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20Claims
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Key dates
| Filing date | Aug 17, 2018 |
| Grant date | Feb 1, 2022 |
| Priority date | — |
| Expiry date | Dec 4, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods of forming plasmonic diamond films are provided. In an embodiment, such a method comprises forming a first layer of diamond on a substrate; depositing a layer of a metal on a surface of the first layer of diamond to form an as-deposited layer of metal; exposing the as-deposited layer of metal to a plasma treatment to convert the as-deposited layer of metal to a plurality of discrete regions of the metal on the surface of the first layer of diamond; and forming a second layer of diamond on the plurality of discrete regions of metal to form the plasmonic diamond film comprising a plurality of plasmonic nanoparticles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.