System for measuring the absorption of a laser emission by a sample
US11237105B2 · kind B2 · utility
Assignees
Inventor
Key dates
| Filing date | Sep 4, 2019 |
| Grant date | Feb 1, 2022 |
| Priority date | — |
| Expiry date | Sep 4, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0697
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for measuring the absorption of a laser radiation by a sample is provided. The system comprises: •(i) a pulsed laser source, suitable for emitting pulses at a repetition frequency fl and arranged so as to illuminate the sample; •(ii) an AFM probe arranged so as to be able to be placed in contact with the region of the surface of the sample on one side, the AFM probe having a mechanical resonance mode at a frequency fm; and •(iii) a detector configured to measure the amplitude of the oscillations of the AFM probe resulting from the absorption of the laser radiation by the region of the surface of the sample, characterized in that it also comprises a translation system designed to displace the sample at a frequency fp.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.