Magnetic flux concentrator for in-plane direction magnetic field concentration
US11237223B2 · kind B2 · utility
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6References
8Claims
0Family size
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Key dates
| Filing date | Jul 24, 2019 |
| Grant date | Feb 1, 2022 |
| Priority date | — |
| Expiry date | Feb 18, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R33/077
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A structure includes a substrate which includes a surface. The structure also includes a horizontal-type Hall sensor positioned within the substrate and below the surface of the substrate. The structure further includes a patterned magnetic concentrator positioned above the surface of the substrate, and a protective overcoat layer positioned above the magnetic concentrator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.