Pixel structure and manufacturing method thereof, array substrate and display device
US11237440B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Aug 7, 2017 |
| Grant date | Feb 1, 2022 |
| Priority date | — |
| Expiry date | Nov 4, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pixel structure and a manufacturing method thereof, an array substrate and a display device are provided. The pixel structure includes: a signal line; a common electrode line an extension direction of which is same as an extension direction of the signal line; a transistor including a semiconductor layer which includes a source region and a drain region; a first storage electrode which is insulated from the common electrode line and is connected with the drain region of the semiconductor layer; and a second storage electrode which is connected with the common electrode line and is insulated from the first storage electrode. In the pixel structure, portions, between the signal line and the common electrode line, of the first storage electrode and the second storage electrode includes overlap with each other to form a first storage capacitance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.