Fabrication method of panel, panel and display device
US11237666B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Jan 4, 2018 |
| Grant date | Feb 1, 2022 |
| Priority date | — |
| Expiry date | Dec 10, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2203/04111
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A fabrication method of a panel, a panel and a display device are provided. The fabrication method of the panel includes: forming a first conductive layer on a base substrate by using a patterning process, the first conductive layer including a plurality of first conductive traces provided in a non-working region of the base substrate and a plurality of electrode patterns provided in a working region of the base substrate; forming a plurality of metal traces on the plurality of first conductive traces, wherein, each of the metal traces includes a connection end close to an edge of the working region of the base substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.