Patent · US Active

Thin film transistor substrate and method of fabricating same

US11239331B2 · kind B2 · utility

1Cited by
0References
4Claims
0Family size

Inventors

Key dates

Filing dateOct 24, 2019
Grant dateFeb 1, 2022
Priority date
Expiry dateMay 17, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D30/673

Abstract

A thin film transistor substrate and a method of fabricating same are provided.The thin film transistor substrate includes a substrate, a light shielding layer disposed on the substrate, a buffer layer disposed on the light shielding layer, an active layer disposed on the buffer layer, and a gate insulating layer disposed on the active layer. The gate insulating layer includes a stacked structure including a first insulating layer and a second insulating layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.