Thin film transistor substrate and method of fabricating same
US11239331B2 · kind B2 · utility
1Cited by
0References
4Claims
0Family size
Inventors
Key dates
| Filing date | Oct 24, 2019 |
| Grant date | Feb 1, 2022 |
| Priority date | — |
| Expiry date | May 17, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/673
Abstract
A thin film transistor substrate and a method of fabricating same are provided.The thin film transistor substrate includes a substrate, a light shielding layer disposed on the substrate, a buffer layer disposed on the light shielding layer, an active layer disposed on the buffer layer, and a gate insulating layer disposed on the active layer. The gate insulating layer includes a stacked structure including a first insulating layer and a second insulating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.