Patent · US Active

Gas sensing device and gas concentration sensing method

US11243198B2 · kind B2 · utility

3Cited by
6References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 20, 2020
Grant dateFeb 8, 2022
Priority date
Expiry dateJul 12, 2040

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N33/0036
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A gas sensing device is adapted to detect a concentration of a target gas. The gas sensing device comprises a dielectric layer, a reference sensing portion, a target sensing portion, and a controller. The dielectric layer is disposed on a surface. The reference sensing portion and the target sensing portion are respectively disposed on a supporting side of the dielectric layer, with said supporting side facing away from the surface. The reference sensing portion includes a first conductive layer and a first sensing layer with low sensitivity to the target gas. The target sensing portion includes a second conductive layer and a second sensing layer with high sensitivity to the target gas. The controller obtains the immittance values of the first conductive layer and the second conductive layer, and calculates a concentration value of the target gas according to the immittance values and a correlation function.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.