Patent · US Active

Method for coating a substrate with a lacquer and device for planarising a lacquer layer

US11247229B2 · kind B2 · utility

0Cited by

3References

6Claims

0Family size

Assignee

SUSS MICROTEC LITHOGRAPHY GMBH · DE

Inventors

Katrin Fischer · Stuttgart, DE
Florian Palitschka · Gauting, DE
Johannes Platen · Hohenwestedt, DE
Kento Kaneko · Munich, DE

Key dates

Filing date	Jan 24, 2019
Grant date	Feb 15, 2022
Priority date	—
Expiry date	Apr 13, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/168
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The disclosure relates to a method for coating a substrate with a lacquer. First, the lacquer is uniformly applied to the substrate. Then, the solvent proportion of the lacquer applied to the substrate is reduced, and the coated substrate is exposed to a solvent atmosphere. In some embodiments, the lacquer is heated. The invention also relates to a device for planarising a lacquer layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.