Coating film, method for manufacturing same, and PVD apparatus
US11247903B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 2, 2017 |
| Grant date | Feb 15, 2022 |
| Priority date | — |
| Expiry date | Jul 10, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided is a physical vapor deposition (PVD) method in which a thick, hard carbon film having excellent durability can be formed, and chipping resistance and wear resistance can bot be achieved while improving the low friction properties and peeling resistance of the formed hard carbon film. Provided is a coating film having a total film thickness of greater than 1 μm and less than or equal to 50 μm, wherein, when observed using a bright field TEM image, the cross section of the coating film is revealed to consist of relatively white hard carbon layers and relatively black hard carbon layers alternately stacked in the thickness direction, and the white hard carbon layers have a region having a columns-shape, which has grown in the thickness direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.