Optical film and manufacturing method thereof and display device
US11249222B2 · kind B2 · utility
Assignees
Inventor
Key dates
| Filing date | Dec 12, 2017 |
| Grant date | Feb 15, 2022 |
| Priority date | — |
| Expiry date | May 23, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N13/349
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An optical film, a manufacturing method thereof and a display device are provided. The optical film includes a photonic crystal film substrate and a plurality of linear defective portions penetrating the photonic crystal film substrate in a thickness direction in the photonic crystal film substrate. A lattice period of each of the linear defective portions is different from a lattice period of the photonic crystal film substrate, and the photonic crystal film substrate includes a plurality of first regions and a plurality of second regions. The first regions and the second regions are alternately distributed along at least one direction in a plane where the photonic crystal thin film is located. The linear defective portion located in each of the first regions has a first light exiting direction. The linear defective portion in each of the second regions has a second light exiting direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.