Laser annealing apparatus and sheet resistance calculation apparatus
US11257686B2 · kind B2 · utility
1Cited by
2References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 29, 2018 |
| Grant date | Feb 22, 2022 |
| Priority date | — |
| Expiry date | Feb 22, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A laser beam from a laser optical system is incident onto a semiconductor wafer. Thermal radiation light from the semiconductor wafer is incident onto an infrared detector. The infrared detector outputs a signal based on the intensity of the thermal radiation light. A processing device calculates a sheet resistance of the semiconductor wafer that is annealed by the laser beam on the basis of an output value of the infrared detector, and outputs a calculation value of the sheet resistance to an output device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.