Patent · US Active

Photocurable composition

US11261267B1 · kind B1 · utility

0Cited by

4References

20Claims

0Family size

Assignee

Canon Kabushiki Kaisha · JP

Inventors

Fei Li · Austin, US
Weijun Liu · Cedar Park, US

Key dates

Filing date	Dec 17, 2020
Grant date	Mar 1, 2022
Priority date	—
Expiry date	Dec 17, 2040

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08F222/104
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise 10-40 wt % of a mono-functional monomer of formula (1), with R1 being H or C1-C6 alkyl, and R2 and R3 being one or more substitutions of C1-C10 alkyl or alkyl-aryl, and R4, R5 being H or C1-C10 alkyl, The photocurable composition can have a viscosity of not greater than 15 mPa·s, and a photo-cured layer of the photocurable composition can have a low thermal shrinkage if subjected to a high temperature baking treatment, and a carbon content of at least 74%.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.