Coating film, manufacturing method therefor, and PVD apparatus
US11261519B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 16, 2016 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | Sep 7, 2038 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16J9/26
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The purpose of the invention is to provide technology, which, in addition to being capable of forming thick hard carbon films of excellent durability even using PVD, is able to establish both chipping resistance and wear resistance in the formed hard carbon film and able to improve low friction properties and peeling resistance. Provided is a coating film to be coated on the surface of a substrate, the coating film having a total film thickness of greater than 1 μm to 50 μm wherein: when a cross-section is observed using bright field TEM images, white hard carbon layers that are shown as relatively white and black hard carbon layers that are shown as black are alternately laminated in the thickness direction; and the white hard carbon layers have regions that have grown in a fan-shape in the thickness direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.