Chemical vapor deposition process and coated article
US11261524B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 9, 2019 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | Nov 9, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02123
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Chemical vapor deposition processes and coated articles are disclosed. The process includes a first introducing of a first amount of silane to the enclosed chamber, the first amount of the silane remaining within the enclosed chamber for a first period of time, a first decomposing of the first amount of the silane during at least a portion of the first period of time, a second introducing of a second amount of the silane to the enclosed chamber, the second amount of the silane remaining within the enclosed chamber for a second period of time, and a second decomposing of the second amount of the silane during at least a portion of the second period of time. The process is devoid of inert gas purging between the first decomposing and the second introducing and/or produces a chemical vapor deposition coating devoid of hydrogen bubbles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.