Particle coating
US11261526B2 · kind B2 · utility
0Cited by
2References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 16, 2016 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | Jan 30, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45555
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An atomic layer deposition (ALD) method in an ALD reactor including a reaction chamber housing a substrate vessel, and an isolated vibration source outside of the reaction chamber or isolated within the reaction chamber. Particulate material within the substrate vessel is coated by self-saturating surface reactions using a top-to-bottom precursor flow passing through the substrate vessel, and movements are caused in the particulate material within the substrate vessel by the isolated vibration source while coating the particulate material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.