System and method for use in high spatial resolution ellipsometry
US11262293B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 8, 2018 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | Feb 8, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/214
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
System and method for use in optical monitoring of a sample. The system comprising: a light source unit (140) for providing collimated illumination; polarization modulation unit (160) located in optical path of light propagating from the light source unit; a lens unit (120) for focusing light onto an illumination spot on a surface of a sample, and for collection of light components returning from the sample; a light collection unit configured for collecting light returning from the sample and generate output image data associated with Fourier plane imaging with respect to surface of the sample; and a control unit (500) configured processing said data in accordance with said system calibration. The method provides calibration data, and comprising: providing reference data indicative of complex refractive index of the reference samples on at least two reference samples; collecting ellipsometry data for said at least two reference samples using the ellipsometry system, generating output data having a plurality of data pieces, each associated with unknown angular direction; and for each data piece corresponding to an unknown angular direction, determining simultaneously system paramete…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.