Display apparatus including an amorphous silicon conductive layer and method of manufacturing the same
US11264444B2 · kind B2 · utility
0Cited by
3References
20Claims
0Family size
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Key dates
| Filing date | Dec 11, 2019 |
| Grant date | Mar 1, 2022 |
| Priority date | — |
| Expiry date | Aug 9, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/60
Abstract
A display apparatus includes a base substrate. A first data line is disposed on the base substrate. A first insulating layer is disposed on both the data line and the base substrate. An amorphous silicon conductive layer is disposed on the first insulating layer. A second insulating layer is disposed on the amorphous silicon conductive layer. A second data line is disposed on the second insulating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.