Process for producing synthetic quartz glass using a cleaning device

US11267745B2 · kind B2 · utility

Assignee

• HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

• Hilmar Laudahn · Bitterfeld-Wolfen, DE
• Klaus-Uwe BADEKE · Halle (Saale), DE
• Martin Trommer · Bitterfeld-Wolfen, DE

Key dates

• Filing date: Dec 15, 2015
• Grant date: Mar 8, 2022
• Expiry date: Oct 25, 2037

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03B2207/85
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A method for the production of synthetic quartz glass using a special cleaning device is provided. The method includes (a) evaporating a production material containing a polymerizable polyalkylsiloxane compound while forming a production material vapor, (b) passing the production material vapor resulting from step (a) through a cleaning device to purify the production material vapor, (c) supplying the purified production material vapor resulting from step (b) to a reaction zone in which the purified production material vapor is converted to SiO2 particles through oxidation and/or through hydrolysis, (d) depositing the SiO2 particles resulting from step (c) on a deposition surface, and optionally drying and vitrifying the deposited SiO2 particles resulting from step (d) to form synthetic quartz glass. The cleaning device includes a bulk of porous silica particles which have a BET specific surface area of at least 2 m2/g. A device for carrying out the method is also provided.