Multi-path combined high-low voltage plasma drilling power source and drillling system

US11268326B2 · kind B2 · utility

Assignee

• CHINA UNIVERSITY OF PETROLEUM (EAST CHINA) · CN

Inventors

• Yonghong Liu · Qingdao, CN
• Qiang Sun · Kunshan, CN
• Qingyun Li · Ankang, CN
• Renjie Ji · Shandong, CN
• Baoping Cai · Qingdao, CN
• Xiaopeng Li · Zhejiang, CN
• Yancong Han · Shandong, CN
• Hang Dong · Beijing, CN
• Xinlei Wu · Shanghai, CN
• Peng Liu · San Diego, US
• Dege Li · Shandong, CN

Key dates

• Filing date: Jan 2, 2020
• Grant date: Mar 8, 2022
• Expiry date: Jul 18, 2040

Classification

• Technology area (CPC E): Fixed Constructions
• CPC primary: E21B7/15
• WIPO field: Civil engineering
• WIPO sector: Other fields

Abstract

An embodiment of the present disclosure provides a multi-path combined high-low voltage plasma drilling power source and drilling system. The multi-path combined high-low voltage plasma drilling power source comprises a high-voltage DC circuit, low-voltage DC circuits, high-voltage breakdown modules and an upper computer; wherein the high-voltage DC circuit is connected with the low-voltage DC circuits through cables; the low-voltage DC circuits and the high-voltage breakdown modules simultaneously supply power to plasma generators through cables; the upper computer monitors the low-voltage DC circuits in real time; and the same power source comprises a plurality of low-voltage DC circuits and high-voltage breakdown modules.