Patent · US Active

Method and device for treating substrates

US11270901B2 · kind B2 · utility

0Cited by

4References

10Claims

0Family size

Assignee

RENA Technologies GmbH · DE

Inventors

Stefan-Heinrich Hansen · Waldkirch, DE
Markus Uihlein · Glückstadt, DE
Bernd-Uwe Sander · Freiburg (Elbe), DE
Stephan Alexis Pediaditakis · Heuweiler, DE

Key dates

Filing date	Nov 26, 2019
Grant date	Mar 8, 2022
Priority date	—
Expiry date	Jan 30, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67706
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A device treats substrates with a liquid, which device has a conveying device by which the substrates can be conveyed in a conveying direction through a container containing a liquid. A weir has an edge over which the substrates can run and which, at least in sections, extends obliquely relative to the conveying direction of the substrates. The weir is used in the device for treating substrates with a liquid. The weir has at least one edge which extends obliquely at least in sections.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.