Patent · US Active

Laser system and method forming a high purity fused silica glass sheet with micro-crenellations

US11274056B2 · kind B2 · utility

0Cited by
6References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 16, 2017
Grant dateMar 15, 2022
Priority date
Expiry dateSep 14, 2039

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C2201/3488
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A system and method for sintering a thin, high purity fused silica glass sheet having a thickness of 500 μm or less, includes a step of rastering a beam of a laser across a sheet of high purity fused silica soot; wherein a pattern of the rastering includes tightly spacing target locations on the sheet such that the laser sinters the soot and simultaneously forms tiny notches on a first major surface of the sheet when viewed in cross-section, wherein the tiny notches are crenellated such that at least some of the notches have generally flat bottom surfaces and at least some respective adjoining caps have generally plateau top surfaces offset from the bottom surfaces by steeply-angled sidewalls.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.