Patent · US Active

Method and system for hazardous drug surface cleaning

US11274271B2 · kind B2 · utility

0Cited by
4References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 3, 2020
Grant dateMar 15, 2022
Priority date
Expiry dateApr 3, 2040

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC11D2111/44
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

The present invention relates to a method, a system, and a kit of parts for cleaning a surface contaminated with a hazardous drug or a hazardous drug related product, which involves cleaning in succession with a quaternary ammonium solution followed by an isopropyl alcohol solution.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.