Method and system for hazardous drug surface cleaning
US11274271B2 · kind B2 · utility
0Cited by
4References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 3, 2020 |
| Grant date | Mar 15, 2022 |
| Priority date | — |
| Expiry date | Apr 3, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/44
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to a method, a system, and a kit of parts for cleaning a surface contaminated with a hazardous drug or a hazardous drug related product, which involves cleaning in succession with a quaternary ammonium solution followed by an isopropyl alcohol solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.