Patent · US Active

Pattern part, method for forming pattern part and method for manufacturing display device using same

US11276737B2 · kind B2 · utility

0Cited by
0References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 24, 2019
Grant dateMar 15, 2022
Priority date
Expiry dateFeb 19, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K2102/00

Abstract

A method of forming a pattern part includes forming a first film on a target object, the first film having a first cure shrinkage ratio, forming a second film on the first film, the second film having a second cure shrinkage ratio greater than the first cure shrinkage ratio, and patterning the first film and the second film to form a pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.