Systems and methods for nail treatment
US11278734B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 2, 2020 |
| Grant date | Mar 22, 2022 |
| Priority date | — |
| Expiry date | Apr 2, 2040 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N2005/0667
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Exemplary system and method are provided for affecting nail growth rate, which can use a light dosage and a wavelength of light to affect a growth rate of a nail of a subject. For example, it is possible to detect a presence of a nail using, e.g., a presence detector. The nail can be irradiated over a treatment time with a light having a wavelength and a power, e.g., using a narrowband light source. Further, using a controller, it is possible to control one or more of the power and the treatment time to irradiate the nail with a light dosage that is within a biphasic light dosage range bounded by a lesser light dosage and a greater light dosage. The wavelength of the light and the light dosage can be configured to affect a growth rate of the nail.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.