Patent · US Active

Preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production

US11279806B2 · kind B2 · utility

0Cited by
11References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 8, 2020
Grant dateMar 22, 2022
Priority date
Expiry dateJul 8, 2040

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08K2003/2241
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A process is provided for the preparation of lacing resistant, titanium dioxide particles for use in photodurable thin film production. Said process involves dewatering titanium dioxide particles that have been encapsulated with a layer of amorphous alumina in continuous fashion at temperatures in excess of 100° C.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.