Patent · US Active

Touch substrate, manufacturing method thereof and display apparatus

US11281098B2 · kind B2 · utility

0Cited by
2References
17Claims
0Family size

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Key dates

Filing dateJun 25, 2018
Grant dateMar 22, 2022
Priority date
Expiry dateJan 4, 2040

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F2203/04103
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present discloses is related to a method for manufacturing a touch substrate. The method of manufacturing the touch substrate may include depositing a first conductive film on a base substrate; performing a first joint exposure process based on a first negative photoresist on the base substrate on which the first conductive film was deposited to form a first electrode layer; forming an insulating layer on the base substrate on which the first electrode layer was formed; depositing a second conductive film on the base substrate on which the insulating layer was formed; and performing a second joint exposure process based on a second negative photoresist on the base substrate on which the second conductive film was deposited to form a second electrode layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.