Configuring optical layers in imprint lithography processes
US11281109B2 · kind B2 · utility
1Cited by
3References
17Claims
0Family size
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Key dates
| Filing date | Apr 5, 2021 |
| Grant date | Mar 22, 2022 |
| Priority date | — |
| Expiry date | Apr 5, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.