System and method for repeated metal deposition-dewetting steps to form a nano-particle etching mask producing thicker layer of engraved metasurface
US11294103B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | May 15, 2020 |
| Grant date | Apr 5, 2022 |
| Priority date | — |
| Expiry date | May 15, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1857
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and system is disclosed for creating an optical component having a spatially controlled refractive index and uniform anti-reflective layer. The method may involve alternately depositing and dewetting two or more thin metal material layers on the substrate to form a mask having a spatially varying nano-particle distribution, and with an increased thickness beyond what could be achieved using a single, thick layer of the same material. The substrate may then be etched, using the mask, to imprint a spatially patterned nanostructure pattern on a surface the substrate in accordance with the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.