Process placement in a cloud environment based on automatically optimized placement policies and process execution profiles
US11294730B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 4, 2019 |
| Grant date | Apr 5, 2022 |
| Priority date | — |
| Expiry date | Feb 13, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2209/501
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for placement of processes in a distributed datacenter is described. The method includes receiving, by a first placement node, a placement request corresponding to a process; determining a load estimation for resources managed by the first placement node and a demand estimation for the process based on a process execution profile for the process; determining whether the placement request can be fulfilled with the resources managed by the first placement node based on the demand estimation of the process and the load estimation of the resources managed by the first placement node; executing the process with the resources managed by the first placement node in response to determining that the placement request can be fulfilled with the resources managed by the first placement node; generating an intermediate score based on the execution; and updating a performance score of the process execution profile based on the intermediate score.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.