Patent · US Active

Decomposition chamber for aftertreatment systems

US11300030B2 · kind B2 · utility

1Cited by
25References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 14, 2018
Grant dateApr 12, 2022
Priority date
Expiry dateJan 6, 2040

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02T10/12
  • WIPO fieldEnvironmental technology
  • WIPO sectorChemistry

Abstract

A decomposition chamber for an aftertreatment system includes: a body including: an inlet configured to receive exhaust gas; an outlet configured to expel the exhaust gas, a thermal management chamber in fluid communication with the inlet, the thermal management chamber configured to receive a first portion of the exhaust gas from the inlet, and a main flow chamber in fluid communication with the inlet, the main flow chamber configured to receive a second portion of the exhaust gas from the inlet and to receive the first portion of the exhaust gas from the thermal management chamber; and a diffuser positioned within the main flow chamber, the diffuser including: a diffuser inlet portion including a plurality of diffuser perforations, the diffuser inlet portion configured to receive the exhaust gas from the main flow chamber, and a diffuser flange portion configured to receive the exhaust gas from the diffuser inlet portion and provide the exhaust gas to the outlet.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.