Patent · US Active

Method for preparing CsPbX3 perovskite quantum dot film by one-step crystallization

US11306245B2 · kind B2 · utility

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Key dates

Filing dateJan 21, 2020
Grant dateApr 19, 2022
Priority date
Expiry dateDec 5, 2040

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2004/64
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present disclosure provides a method for preparing a perovskite quantum dot film by one-step crystallization, and belongs to the field of perovskite quantum dot material technology. The present disclosure uses adamantanemethylamine and hydrohalic acid as ligands, first mixes a cesium halide, a lead halide, and the ligands with a solvent to obtain a precursor solution, then deposits the precursor solution on a substrate, and then heats the substrate to obtain the CsPbX3 perovskite quantum dot film. The present disclosure uses adamantanemethylamine and hydrohalic acid as the ligands, which can quickly coat the perovskite, complex with the CsPbX3 perovskite, and directly form the perovskite quantum dot via a strong steric effect. Further, the present disclosure is simple and inexpensive, can directly obtain a high-quality perovskite quantum dot film with a thickness of more than 500 nm by one-step crystallization.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.