Patent · US Active

Method and system for analyzing spatial resolution of microwave near-field probe and microwave microscope equipped with the system

US11307219B2 · kind B2 · utility

0Cited by
1References
7Claims
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Key dates

Filing dateApr 12, 2021
Grant dateApr 19, 2022
Priority date
Expiry dateApr 12, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E60/00
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

The present disclosure relates to the technical field of microwave test, and discloses a method and a system for analyzing the spatial resolution of a microwave near-field probe and a microwave microscope equipped with the system, wherein in the method for analyzing the spatial resolution of the microwave near-field probe, a three-dimensional equipotential surface in a sample is drawn by using an electric field formula calculated by a quasi-static theory; an equivalent model of a probe sample is established by using finite element analysis software, so as to change material characteristics in the area outside the three-dimensional equipotential surface; by observing the influence of changing materials on the potential distribution in the sample, a near-field action range of the probe is determined, and the spatial resolution of the microwave near-field scanning microscope is analyzed and calculated.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.