Patent · US Active

Array substrate and manufacturing method thereof

US11307468B2 · kind B2 · utility

0Cited by

0References

15Claims

0Family size

Assignee

WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. · CN

Inventors

Yuan-Yong Yan · 红钢城街道, CN
Yong Xu · 红钢城街道, CN
Dewei Song · 红钢城街道, CN
Fei AI · 红钢城街道, CN

Key dates

Filing date	Nov 11, 2019
Grant date	Apr 19, 2022
Priority date	—
Expiry date	Mar 30, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG06F2203/04103
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present disclosure provides an array substrate and a manufacturing method of the array substrate. The method includes sequentially forming an active layer and an insulating layer on a substrate; forming a common electrode layer and a first metal layer on the insulating layer using a same photomask, wherein the common electrode layer includes touch electrodes; and forming a second metal layer on the pixel electrode layer, wherein the second metal layer includes touch signal lines, and the touch signal lines electrically are electrically connected to the touch electrodes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.