Patent · US Active

Mask, mask assembly, exposure machine, method for testing shadowing effect on window, and photolithography method

US11307491B2 · kind B2 · utility

0Cited by

1References

17Claims

0Family size

Assignees

BOE Technology Group Co., Ltd. · CN
Ordos Yuansheng Optoelectronics Co., Ltd. · CN

Inventors

Jiabin Cui · Beijing, CN
Li-Chien Wang · Taichung, TW
Zhibin Li · Yuanjiang Hani, Yi and Dai Autonomous County, CN
Pengfei Liang · Nanhu, CN
Chang Liu · Fremont, US
Peng Chen · Beijing, CN

Key dates

Filing date	Dec 8, 2017
Grant date	Apr 19, 2022
Priority date	—
Expiry date	May 29, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/7085
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A mask, a mask assembly, an exposure machine, a method for testing shadowing effect on a window, and a photolithography method are provided. The mask includes a light transmission area; a functional window provided at a side of the light transmission area; and at least one of a first detection mark and a second detection mark; wherein the first detection mark is flushed with a border of the functional window adjacent to an interior of the mask; and the second detection mark is disposed between the profile of the light transmission area and the functional window.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.