Active gas generation apparatus and deposition processing apparatus
US11309167B2 · kind B2 · utility
0Cited by
10References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2018 |
| Grant date | Apr 19, 2022 |
| Priority date | — |
| Expiry date | Jun 27, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/332
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In the present invention, a gas passing groove, a high-voltage electrode groove and a ground electrode groove formed in an electrode unit base are each spiral in plan view. A high-voltage electrode is embedded in the high-voltage electrode grove, and a ground electrode is embedded in the ground electrode groove. The high-voltage electrode and the ground electrode are arranged on sides of opposite side surfaces of the gas passing groove in the electrode unit base to oppose each other with a portion of the electrode unit base and the gas passing groove therebetween, and are spiral in plan view along with the gas passing groove.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.