Display substrate and manufacturing method thereof
US11309358B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 3, 2017 |
| Grant date | Apr 19, 2022 |
| Priority date | — |
| Expiry date | Dec 16, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A display substrate and a manufacturing method thereof are disclosed. The display substrate is divided to have a non-pixel region and a color pixel region. The manufacturing method includes: forming a thin film transistor (TFT) on a base substrate in the non-pixel region; forming a passivation layer on the TFT; forming a color filter on the passivation layer in the color Pixel region; forming a planarization layer on the passivation layer and the color filter; thinning a thickness of a portion of the planarization layer located in the color pixel region; and forming a display electrode on the planarization layer and connecting the display electrode to a drain electrode of the TFT through a via hole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.