Device for analyzing impact and puncture resistance

US11313879B2 · kind B2 · utility

Assignees

• DOW GLOBAL TECHNOLOGIES LLC · US
• Rohm and Haas Company · US

Inventors

• Donald L. McCarty, II · Midland, US
• Erick Sutanto · Collegeville, US
• Larry D. Dotson · Midland, US
• Brayden E. Glad · Lake Jackson, US
• Hitendra Singh · Lake Jackson, US
• John Lund · Midland, US

Key dates

• Filing date: Apr 30, 2018
• Grant date: Apr 26, 2022
• Expiry date: Feb 13, 2039

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2203/0494
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A device for analyzing a physical characteristic of a film sample is described herein. The device includes a clamping system configured to hold the film sample. The device further includes a dart probe system configured to test a physical characteristic of the film sample. The dart probe system has a dart probe, a propulsion system configured to move the dart probe relative to the clamping system, and a force sensor configured to measure a force that the dart probe is subjected to during a movement of the dart probe. The force sensor is configured to measure a force imparted to the film sample when the dart probe comes in contact with the film sample.