Materials amd methods for buffering active chlorine solutions
US11317632B2 · kind B2 · utility
0Cited by
1References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 2018 |
| Grant date | May 3, 2022 |
| Priority date | — |
| Expiry date | Jan 17, 2038 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA01N59/26
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The invention provides buffers stable to oxidants, including chlorine and hypochlorous acid, which are usable in the pH range 3-7. The invention also provides stable, buffered solutions comprising hypochlorous acid, having a pH between 3 and 7, and disposable wiping articles impregnated with these solutions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.