Manufacturing method of display substrate, display substrate and display device
US11320691B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Jul 11, 2019 |
| Grant date | May 3, 2022 |
| Priority date | — |
| Expiry date | Mar 15, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/4669
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are a manufacturing method of a display substrate, a display substrate and a display device, which belongs to the field of display technologies. The manufacturing method of the display substrate includes: forming a first planarization layer on a base substrate on which a patterned film layer is formed; forming a first buffer layer on the side, away from the base substrate, of the first planarization layer; forming a second buffer layer on the side, away from the base substrate, of the first buffer layer; and forming a Wire Grid Polarizer (WGP) on the side, away from the base substrate, of the second buffer layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.