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US11322363B2 · kind B2 · utility

0Cited by
19References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 4, 2020
Grant dateMay 3, 2022
Priority date
Expiry dateJul 21, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D64/62
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Atoms are implanted in a semiconductor region at a higher concentration in a peripheral part of the semiconductor region than in a central part of the semiconductor region. A metallic region is then formed to cover the semiconductor region. A heat treatment is the performed to form an intermetallic region from the metallic region and the semiconductor region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.