Active matrix substrate, display device, and method of manufacturing active matrix substrate
US11322523B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Jun 28, 2018 |
| Grant date | May 3, 2022 |
| Priority date | — |
| Expiry date | Nov 7, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG04B19/04
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To reduce a reduction in the quality of a displayed image in portions corresponding to source lines including detour portions in a display area. Gate lines (20) and source lines (30), which intersect with each other, extend on an insulating substrate (1) so as to detour an opening area (A1). Separated portions (24) are provided as lower shielding electrodes (23) in an inner non-display area (A2) so as to be overlapped with source detour portions (31) of the source lines (30) in a plan view.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.