Optomechanical system for absorbing light or emitting light and corresponding method
US11322633B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Dec 5, 2017 |
| Grant date | May 3, 2022 |
| Priority date | — |
| Expiry date | Feb 20, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optomechanical system for absorbing light or emitting light, comprising as static frame element, an optical arrangement, a light absorbing/emitting substrate and a shifting mechanism. The shifting mechanism moves at least one layer of the optical arrangement relative to the light absorbing/emitting substrate or vice versa, wherein the movement is through one or more translation element relative to the static frame element in such a way that the transmitted light can be optimally absorbed by the light absorbing/emitting substrate, or that the incident light emitted by the light absorbing/emitting substrate can be optimally transmitted by the optical arrangement. Furthermore, the present invention also relates to a corresponding method for absorbing light or emitting light with the aforementioned optomechanical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.