Method for generating mask, and projection apparatus for performing the same
US11323675B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2021 |
| Grant date | May 3, 2022 |
| Priority date | — |
| Expiry date | Mar 30, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/10152
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for generating a mask and a projection apparatus for performing the method are provided. The method includes: projecting a first pattern onto a projection surface, wherein the projection surface includes a non-planar region, and the first pattern includes multiple first straight lines; shooting a first image of the projection surface on which the first pattern is rendered; finding at least one first specific line segment in the first image, wherein each first specific line segment includes at least one first inflection point; delineating a first contour based on the at least one first inflection point in a case of determining that the at least one first inflection point in the first image is suitable for delineating the first contour; and generating a first mask pattern based on the first contour in a case of determining that the first contour matches a region contour of the non-planar region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.