Polar elastomer microstructures and methods for fabricating same
US11329228B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Dec 19, 2017 |
| Grant date | May 10, 2022 |
| Priority date | — |
| Expiry date | May 29, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K10/471
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating microstructures of polar elastomers includes coating a substrate with a dielectric material including a polar elastomer, coating the dielectric material with a photoresist, exposing the photoresist to ultraviolet (UV) light through a photomask to define a pattern on the photoresist, developing the photoresist to form the pattern on the photoresist, etching the dielectric material to transfer the pattern from the photoresist to the dielectric material, and removing the photoresist from the patterned dielectric material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.