Thermal substrate with high-resistance magnification and positive temperature coefficient ink
US11332632B2 · kind B2 · utility
1Cited by
19References
19Claims
0Family size
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Key dates
| Filing date | Jan 13, 2021 |
| Grant date | May 17, 2022 |
| Priority date | — |
| Expiry date | Jan 13, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2201/10196
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An article comprising a heater that comprises a high-resistance magnification (HRM) PTC ink deposited on a flexible substrate to form one or more resistors. The HRM PTC ink has a resistance magnification of at least 20 in a temperature range of at least 20 degrees Celsius above a switching temperature of the ink, the resistance magnification being defined as a ratio between a resistance of the double-resin ink at a temperature ‘T’ and a resistance of the double-resin ink at 25 degrees Celsius.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.