Gas-liquid falling film equilibration system and methods of use
US11333589B2 · kind B2 · utility
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4References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 21, 2019 |
| Grant date | May 17, 2022 |
| Priority date | — |
| Expiry date | Mar 21, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/18
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The current disclosure provides a gas-liquid falling film equilibration apparatus, systems incorporating the apparatus, and methods of their use. The apparatus comprises a chamber, an equilibration member within the chamber, liquid and gas inlet and outlets, such that a liquid introduced into the chamber from the liquid inlet contacts the upper portion of the outer surface of the equilibration member. The apparatus finds use in the measurement of dissolved gases in a variety of liquids including the measurement of carbon dioxide in water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.