Patent · US Active

Cleaning station for optical elements

US11338332B2 · kind B2 · utility

0Cited by
1References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 5, 2018
Grant dateMay 24, 2022
Priority date
Expiry dateNov 5, 2038

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB08B2203/007
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A cleaning station for an optical element is providing, including: an optical element holder configured to hold the optical element; a first drive configured to rotate the optical element holder around a rotation axis coinciding with an optical axis of the optical element when held by the optical element holder; a cleaning nozzle configured to project a cleaning jet of a cleaning liquid towards the optical element; and a separate drying nozzle configured to project a drying jet towards the optical element, the cleaning nozzle and the drying nozzle being configured to move in order to direct the cleaning jet and the drying jet, respectively, successively to different locations on the optical element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.